Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-05-15
2007-05-15
Tran, Minhloan (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S329000, C257SE29131
Reexamination Certificate
active
11080443
ABSTRACT:
Very fast integrated OPL circuits, such as pseudo-NMOS OPL and dynamic OPL, comprising CMOS gate arrays having ultra-thin vertical NMOS transistors are disclosed. The ultra-thin vertical NMOS transistors of the CMOS gate arrays are formed with relaxed silicon germanium (SiGe) body regions with graded germanium content and strained silicon channels.
REFERENCES:
patent: 4569032 (1986-02-01), Lee
patent: 5308785 (1994-05-01), Comfort et al.
patent: 5451800 (1995-09-01), Mohammad
patent: 5714777 (1998-02-01), Ismail et al.
patent: 5821577 (1998-10-01), Crabbe′ et al.
patent: 5914504 (1999-06-01), Augusto
patent: 6107653 (2000-08-01), Fitzgerald
patent: 6191432 (2001-02-01), Sugiyama et al.
patent: 6313487 (2001-11-01), Kencke et al.
patent: 6323108 (2001-11-01), Kub et al.
patent: 6727550 (2004-04-01), Tezuka et al.
patent: 6744083 (2004-06-01), Chen et al.
patent: 6900521 (2005-05-01), Forbes et al.
patent: 2002/0030203 (2002-03-01), Fitzgerald
patent: 2002/0030227 (2002-03-01), Bulsara et al.
patent: 2002/0098655 (2002-07-01), Zheng et al.
patent: 2002/0123167 (2002-09-01), Fitzgerald
patent: 2002/0125471 (2002-09-01), Fitzgerald et al.
patent: 2002/0125497 (2002-09-01), Fitzgerald
patent: 2002/0167048 (2002-11-01), Tweet et al.
patent: 2002/0168864 (2002-11-01), Cheng et al.
patent: 2002/0179946 (2002-12-01), Hara et al.
patent: 2003/0034529 (2003-02-01), Fitzgerald et al.
patent: 2003/0057439 (2003-03-01), Fitzgerald
patent: 2003/0068883 (2003-04-01), Ajmera et al.
patent: 2003/0089901 (2003-05-01), Fitzgerald
patent: 2003/0201458 (2003-10-01), Clark et al.
patent: 2004/0157353 (2004-08-01), Ouyang et al.
patent: 2004/0256639 (2004-12-01), Ouyang et al.
patent: 2004/0256647 (2004-12-01), Lee et al.
patent: 2004/0266112 (2004-12-01), Skotnicki et al.
patent: 2005/0003599 (2005-01-01), Yeo et al.
Wolf, Ph.D., et al., “Silicon Epitaxial Film Growth,” Silicon Processing for the VLSI Era—vol. 1: Process Technology, Lattice Press, 1986, pp. 133-139.
Ahn Kie Y.
Forbes Leonard
Dickstein & Shapiro LLP
Liu Benjamin Tzu-Hung
Micro)n Technology, Inc.
Tran Minhloan
LandOfFree
Output prediction logic circuits with ultra-thin vertical... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Output prediction logic circuits with ultra-thin vertical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Output prediction logic circuits with ultra-thin vertical... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3728752