Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate
2006-12-26
2006-12-26
Hassanzadeh, Parviz (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
Having glow discharge electrode gas energizing means
C118S7230ER
Reexamination Certificate
active
07153387
ABSTRACT:
There is provided a plasma processing system and method capable of decreasing the non-uniformity of a field distribution on the surface of an electrode and making the density of plasma uniform, in a plasma processing using a high density plasma which can cope with a further scale down. First and second electrodes21and5are provided in a chamber so as to face each other. A feeder plate52is arranged so as to be slightly spaced from the opposite surface of a surface serving as a feeding plane of the first electrode facing the second electrode5. A feeder rod51is connected to the feeder plate52at a position which is radially shifted from a position corresponding to the center of the feeding plane of the first electrode21. The feeder plate52is rotated to rotate the feeding position of the feeder rod51on the feeding plane of the first electrode. A high frequency electric power is thus fed to form a high frequency electric field between the first and second electrodes21and5to form plasma to plasma-process a substrate W.
REFERENCES:
patent: 6142096 (2000-11-01), Sakai et al.
patent: 6155202 (2000-12-01), Nakano et al.
patent: 6359250 (2002-03-01), Blonigan et al.
patent: 0 663 682 (1995-07-01), None
patent: 0 930 642 (1999-07-01), None
patent: 3-206613 (1991-09-01), None
patent: 05013343 (1993-01-01), None
patent: 5-29273 (1993-02-01), None
patent: 05198390 (1993-08-01), None
patent: 6-333697 (1994-12-01), None
patent: 10-32171 (1998-02-01), None
patent: WO 00/03415 (2000-01-01), None
PCT Notification of Transmittal of Copies of Translation of the International Preliminary Examination Report (PCT/IB/338) issued for PCT/JP00/05408.
International Preliminary Examination Report (PCT/IPEA/409) (translated) issued for PCT/JP00/05408.
Supplementary European Search Report issued in connection with EP 00 95 1961, dated Nov. 9, 2005.
Crowell Michelle
Hassanzadeh Parviz
Tokyo Electron Limited
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