Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-11-07
2006-11-07
Bali, Vikkram (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S145000
Reexamination Certificate
active
07133548
ABSTRACT:
A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.
REFERENCES:
patent: 3725574 (1973-04-01), Gast
patent: 4148065 (1979-04-01), Nakagawa et al.
patent: 4595289 (1986-06-01), Feldman et al.
patent: 4922308 (1990-05-01), Noguchi et al.
patent: 4926489 (1990-05-01), Danielson et al.
patent: 5210635 (1993-05-01), Nagata et al.
patent: 5272116 (1993-12-01), Hosono
patent: 5441834 (1995-08-01), Takekuma et al.
patent: 5481624 (1996-01-01), Kamon
patent: 5563702 (1996-10-01), Emery et al.
patent: 5572598 (1996-11-01), Wihl et al.
patent: 5576829 (1996-11-01), Shiraishi et al.
patent: 5744381 (1998-04-01), Tabata et al.
patent: 5745168 (1998-04-01), Ninomiya
patent: 5795688 (1998-08-01), Burdorf et al.
patent: 5838433 (1998-11-01), Hagiwara
patent: 5892579 (1999-04-01), Elyasaf et al.
patent: 5965306 (1999-10-01), Mansfield et al.
patent: 6016357 (2000-01-01), Neary et al.
patent: 6018392 (2000-01-01), Tzu et al.
patent: 6025905 (2000-02-01), Sussman
patent: 6052478 (2000-04-01), Wihl et al.
patent: 6072898 (2000-06-01), Beaty et al.
patent: 6075883 (2000-06-01), Stern et al.
patent: 6078393 (2000-06-01), Oohashi et al.
patent: 6078738 (2000-06-01), Garza et al.
patent: 6081659 (2000-06-01), Garza et al.
patent: 6091845 (2000-07-01), Pierrat et al.
patent: 6124924 (2000-09-01), Feldman et al.
patent: 6148097 (2000-11-01), Nakayama et al.
patent: 6268093 (2001-07-01), Kenan et al.
patent: 6327033 (2001-12-01), Ferguson et al.
patent: 6335129 (2002-01-01), Asano et al.
patent: 6466315 (2002-10-01), Karpol et al.
patent: 6580502 (2003-06-01), Kuwabara
patent: 2002/0171825 (2002-11-01), Krantz et al.
patent: 0 628 806 (1994-12-01), None
Martino, R., et al., “Application of the Aerial Image Measurement System (AIMS™) to the Analysis of Binary Mask Imaging and Resolution Enhancement Techniques, ”SPIE, vol. 2197, Jan. 1994, pp. 573-584.
Ferguson, Richard A., et al., “Application of an Aerial Image Measurement System to Mask Fabrication and Analysis,”SPIEvol. 2807 13thAnnual Symposium on Photomask Technology and Management Sep. 23-23, 1993, Santa Clara, California. pp. 131-144.
BUDD, RUSSELL A., et al., “A New Tool for Phase Shift Mask Evaluation, the Stepper Equivalent Aerial Image Measurement System—AIMS™,”SPIE, vol. 2087 Photomask Technology and Management (1993).
SCHENKER, RICHARD, “Comparison of Single and Dual Exposure Phase Shift Mask Approaches for Poly Gate Patterning,”SPIE, vol. 3546, Sep. 1998.
LEVENSON, MARC D., et al., “Improving Resolution in Photolithography with a Phase Shifting Mask,”IEEE Transactions on Electron Devices, vol. ED-29, No. 12, Dec. 1982.
BUDD, R.A., et al., “A New Mask Evaluation Tool, the Microlitography Simulation Microscope Aerial Image Measurement System,”Optical/Laser Microlithography 7, San Jose, Mar. 2-4, 1994, Proceedings of SPIE, Optical/Laser Microlithography, Bellingham, SPIE, US vol. 2197, pp. 530-540.
Elyasaf Emanuel
Eran Yair
Karpol Avner
Kenan Boaz
Tirosh Ehud
Applied Materials Inc.
Bach Joseph
Bali Vikkram
Sughrue & Mion, PLLC
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