Optical system for providing a hexapole illumination and...

Details Optical system for providing a hexapole illumination and... Optical system for providing a hexapole illumination and...

2006-11-21

2006-11-21

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S055000

Reexamination Certificate

active

07139064

ABSTRACT:
In an optical system for forming a photoresist pattern on a substrate, an optical element such as a holographic optical element and an aperture plate provides an off-axis illumination beam having a hexapole. The photoresist pattern is formed to form structures such as contact pads, and includes first holes and second holes repeatedly arranged on the substrate. The hexapole includes four first poles symmetrically disposed with respect to an x-axis and a y-axis, and two second poles disposed in the x-axis so as to be symmetric with respect to the y-axis. The off-axis illumination beam may improve a resolution of the photoresist pattern and a depth of focus (DOF) of a light beam to be projected onto the substrate.

REFERENCES:
patent: 2004/0174512 (2004-09-01), Toyoda et al.
patent: 2004/0207829 (2004-10-01), Hansen et al.
patent: 000025202 (2000-05-01), None

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