Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Reexamination Certificate
2006-10-10
2006-10-10
Meeks, Timothy (Department: 1762)
Coating processes
Coating by vapor, gas, or smoke
Mixture of vapors or gases utilized
C427S255280, C427S248100, C118S719000, C118S726000, C118S727000, C118S730000
Reexamination Certificate
active
07118783
ABSTRACT:
CVD, ALD, and other vapor processes used in processing semiconductor workpieces often require volatilizing a liquid or solid precursor. Certain embodiments of the invention provide improved and/or more consistent volatilization rates by moving a reaction vessel. In one exemplary embodiment, a reaction vessel is rotated about a rotation axis which is disposed at an angle with respect to vertical. This deposits a quantity of the reaction precursor on an interior surface of the vessel's sidewall which is exposed to the headspace as the vessel rotates. Other embodiments employ drivers adapted to move the reaction vessel in other manners, such as a pendulum arm to oscillate the vessel along an arcuate path or a mechanical linkage which moves the vessel along an elliptical path.
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Carpenter Craig M.
Dando Ross S.
Derderian Garo J.
Gealy Dan
Mardian Allen P.
Abramowitz Howard
Meeks Timothy
Micro)n Technology, Inc.
Perkins Coie LLP
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