Coating apparatus – Gas or vapor deposition – Chamber seal
Patent
1997-07-11
2000-04-04
Bryant, David P.
Coating apparatus
Gas or vapor deposition
Chamber seal
118719, 294011, 20429825, 414217, 414939, C23C 1600
Patent
active
060456205
ABSTRACT:
A vacuum processing system has a transfer chamber with a slit valve at which is attached a process chamber and with a slit valve insert disposed in the slit valve for matching up with the process chamber. The slit valve may be made of two pieces, an outer portion that slides into the transfer chamber's slit valve opening from the outside of the transfer chamber, and an inner portion that slides into the outer portion from the inside of the transfer chamber. The portions of the insert permit any process chamber to be attached to any slit valve opening. The outer portion may not be removed from the slit valve opening when a process chamber is attached to the transfer chamber, but the inner portion may be easily removed for servicing regardless of in whether a process chamber is attached.
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Lowrance Robert B.
Tepman Avi
Applied Materials Inc.
Bryant David P.
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