Solid source precursor delivery system

Details Solid source precursor delivery system Solid source precursor delivery system

2006-09-19

2006-09-19

Smith, Matthew (Department: 2823)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C118S726000, C118S715000

Reexamination Certificate

active

07109113

ABSTRACT:
A solid source precursor material is delivered to a deposition chamber in vaporized form by utilizing a solid source precursor delivery system having either single or multiple stations(s) having a collection/delivery reservoir that is an intermediate stage between a solid source reservoir and a processing deposition chamber. Each collection/delivery reservoir transitions between a collection phase of the solid precursor and the delivery stage of the vaporized precursor during the deposition of a film.

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patent: 6313035 (2001-11-01), Sandhu et al.
Lee et. al, Mass Production Worthy HfO2-Al2O3 Laminate Capacitor Technology using Hf Liquid Precursor for Sub-100 nm DRAMs, Dec. 2002,IEEE Conference, pp. 221-224.

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