Process for producing an etching mask on a microstructure,...

Details Process for producing an etching mask on a microstructure,... Process for producing an etching mask on a microstructure,...

2006-05-02

2006-05-02

Chaudhari, Chandra (Department: 2891)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S248000

Reexamination Certificate

active

07037777

ABSTRACT:
Process for producing an etching mask on a microstructure, in particular a semiconductor structure with trench capacitors, and corresponding uses of the etching mask which allow for extremely thin photoresist layers to be employed.

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patent: 6204112 (2001-03-01), Chakravarti et al.
patent: 6809368 (2004-10-01), Divakaruni et al.
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patent: 100 00 003 (2001-07-01), None
patent: 0932187 (1999-07-01), None

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