In-situ cleaning of beam defining apertures in an ion implanter

Details In-situ cleaning of beam defining apertures in an ion implanter In-situ cleaning of beam defining apertures in an ion implanter

2006-01-31

2006-01-31

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, C250S492300, C250S42300F, C250S424000

Reexamination Certificate

active

06992311

ABSTRACT:
A method for cleaning an ion implantation, comprising providing an ion implantation system, wherein the ion implantation system comprises one or more components having one or more contaminants disposed thereon. A process species is provided to the ion implantation system, wherein the process species is otherwise utilized to implant ions into a workpiece. Ions are formed from the process species, therein defining an ion source. An ion beam is then extracted from the ion source via an application of an extraction voltage to an ion extraction assembly associated with the ion source. The extraction voltage is further modulated, wherein a trajectory of the ion beam is oscillated within a predetermined range. The ion beam is consequently swept across the one or more components, thus substantially removing the one or more contaminants therefrom.

REFERENCES:
patent: 5554854 (1996-09-01), Blake
patent: 5633506 (1997-05-01), Blake
patent: 6221169 (2001-04-01), Bernstein et al.
patent: 6313905 (2001-11-01), Brugger et al.
patent: 6559462 (2003-05-01), Carpenter et al.
patent: 6573517 (2003-06-01), Sugitani et al.
patent: 2003/0042427 (2003-03-01), Sullivan et al.

Affiliated with

Also associated with

Rating

In-situ cleaning of beam defining apertures in an ion implanter does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with In-situ cleaning of beam defining apertures in an ion implanter, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and In-situ cleaning of beam defining apertures in an ion implanter will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3568057