Photomask having a focus monitor pattern

Details Photomask having a focus monitor pattern Photomask having a focus monitor pattern

2006-09-19

2006-09-19

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07108945

ABSTRACT:
A photomask has a device pattern, which has an opening portion and a mask portion, and either a focus monitor pattern or an exposure dose monitor pattern, which has an opening portion and a mask portion and which has the same plane pattern shape as at least a partial region of a device pattern. The phase difference in transmitted exposure light between the opening portion and the mask portion of the focus monitor pattern is different from that between the opening portion and the mask portion of the device pattern. The opening portion of the exposure dose monitor pattern has a different exposure dose transmittance from that of the opening portion of the device pattern.

REFERENCES:
patent: 5300786 (1994-04-01), Brunner et al.
patent: 6376139 (2002-04-01), Fujisawa et al.
patent: 6440616 (2002-08-01), Izuha et al.
patent: 2002/0100012 (2002-07-01), Sutani et al.
patent: 2002/0182521 (2002-12-01), Fujisawa et al.
patent: 2539163 (1996-07-01), None
patent: 9-329889 (1997-12-01), None
patent: 2803963 (1998-07-01), None
patent: 2000-310850 (2000-11-01), None
patent: 2001-189264 (2001-07-01), None
Notice of Grounds for Rejection issued by the Japanese Patent Office, mailed Feb. 21, 2006, for Japanese Patent Application No. 2002-090010, and English-language translation thereof.

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