Systems and methods for forming metal oxides using alcohols

Details Systems and methods for forming metal oxides using alcohols Systems and methods for forming metal oxides using alcohols

2006-05-09

2006-05-09

Pham, Hoai (Department: 2814)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S240000, C438S643000, C438S681000

Reexamination Certificate

active

07041609

ABSTRACT:
A method of forming (and an apparatus for forming) a metal oxide layer on a substrate, particularly a semiconductor substrate or substrate assembly, using a vapor deposition process, one or more alcohols, and one or more metal-containing precursor compounds.

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