Resist compositions with polymers having 2-cyano acrylic...

Details Resist compositions with polymers having 2-cyano acrylic... Resist compositions with polymers having 2-cyano acrylic...

2005-06-07

2005-06-07

Gilliam, Barbara L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S311000, C430S313000, C430S314000, C430S324000

Reexamination Certificate

active

06902874

ABSTRACT:
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer having a 2-cyano acrylic monomer.

REFERENCES:
patent: 6627391 (2003-09-01), Ito et al.
patent: 2002/0187419 (2002-12-01), Dammel et al.

Affiliated with

Also associated with

Rating

Resist compositions with polymers having 2-cyano acrylic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Resist compositions with polymers having 2-cyano acrylic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Resist compositions with polymers having 2-cyano acrylic... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3465488