Method for cleaning plasma enhanced chemical vapor...

Details Method for cleaning plasma enhanced chemical vapor... Method for cleaning plasma enhanced chemical vapor...

2005-08-23

2005-08-23

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S022100, C134S022180, C134S031000, C134S902000, C438S905000

Reexamination Certificate

active

06932092

ABSTRACT:
A method for cleaning a plasma enhanced chemical vapor deposition chamber. The method includes introducing a cleaning gas into the plasma enhanced chemical vapor deposition chamber, forming a plasma using a very high frequency (VHF) power having a frequency in a range from about 20 MHz to about 100 MHz, and reacting the cleaning gas with deposits within the chamber in the presence of the plasma.

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