Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2005-05-24
2005-05-24
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S325000, C430S326000, C430S394000, C438S401000, C438S460000, C438S462000
Reexamination Certificate
active
06897010
ABSTRACT:
A method of recording identifiers, each including a group of character strings A and B including z1, and z2characters, respectively, on plate members involves the use of a photomask of a first type and at least one photomask of a second type. The photomask of the first type has an opaque pattern defining the character string A. The photomask of the second type has an opaque pattern defining at least one of the characters of the character string B. The method further includes the steps of forming a photoresist layer on one of the plate members, selectively exposing the photoresist layer to a radiation through the photomask of the first type to form a latent image of the character string A in the photoresist layer, and forming a latent image of the character of the character string B in the photoresist layer through the photomask of the second type.
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U.S. Patent Application No. 10/211,568; Method for Recording Identifier and Set of Photomasks; filed on Aug. 5, 2002, Talsuke Hirooka.
Chu John S.
Keating & Bennett LLP
Neomax Co. Ltd.
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