Method and apparatus for enhanced chamber cleaning

Details Method and apparatus for enhanced chamber cleaning Method and apparatus for enhanced chamber cleaning

2005-03-08

2005-03-08

Olsen, Allan (Department: 1763)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S002000, C134S021000, C134S022100, C134S022110, C216S037000, C216S067000

Reexamination Certificate

active

06863077

ABSTRACT:
A system for processing substrates within a chamber and for cleaning accumulated material from chamber components is provided. The system includes a reactive species generator adapted to generate a reactive gas species for chemically etching accumulated material from chamber components, and a processing chamber having at least one component with a mirror polished surface which is exposed to the reactive species. Preferably to have the greatest impact on chamber cleaning efficiency, the mirror polished surface is a surface of a component such as a gas distribution plate or a backing plate, and/or is a surface of a plurality of smaller components (e.g., chamber wall liners, a gas conductance line, etc.) so as to constitute a large percentage of the surface area exposed to the reactive species. Most preferably all bare aluminum surfaces which the reactive species contacts are mirror polished.

REFERENCES:
patent: 3717439 (1973-02-01), Sakai
patent: 5277740 (1994-01-01), Yoneda
patent: 5362328 (1994-11-01), Gardiner et al.
patent: 5904800 (1999-05-01), Mautz
patent: 6110283 (2000-08-01), Yamamuka et al.
patent: 6283060 (2001-09-01), Yamazaki et al.
patent: 03 185723 (1991-08-01), None

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