Polymers, resist compositions and patterning process

Details Polymers, resist compositions and patterning process Polymers, resist compositions and patterning process

2005-03-29

2005-03-29

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S270100, C430S320000, C430S322000, C430S325000, C430S327000, C430S905000, C430S907000, C430S910000, C430S914000, C526S243000, C526S281000, C526S282000, C526S286000, C526S287000

Reexamination Certificate

active

06872514

ABSTRACT:
A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation below 300 nm, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.

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