Photosensitive polymer including copolymer of alkyl vinyl...

Details Photosensitive polymer including copolymer of alkyl vinyl... Photosensitive polymer including copolymer of alkyl vinyl...

2005-05-24

2005-05-24

Le, Hoa Van (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S913000, C430S914000

Reexamination Certificate

active

06897005

ABSTRACT:
There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure:wherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structureswherein y is one of the integer values 1 through 4, R1is one of a hydrogen atom and a methyl group, R2is a C1to C20hydrocarbon, and R3is one of a hydrogen atom, a C1to C3alkyl group and an alkoxy group.

REFERENCES:
patent: 6303266 (2001-10-01), Okino et al.
patent: 6306554 (2001-10-01), Barclay et al.

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