Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-03-22
2005-03-22
VerSteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S298040, C204S298150, C118S7230VE, C118S7230EB, C118S719000, C118S726000, C118S729000, C427S576000, C427S595000, C427S596000, C427S597000, C427S248100, C427S251000, C427S255500
Reexamination Certificate
active
06869508
ABSTRACT:
A PVD process and apparatus (120) for depositing a coating (132) from multiple sources (110, 111) of different materials. The process and apparatus (120) are particulaity intended to deposit a beta-nickel aluminide coating (132) containing one or more elements whose vapor pressures are lower than NiAl. The PVD process and apparatus (120) entail feeding at least two materials (110, 111) into a coating chamber (122) and evaporating the materials (110, 111) at different rates from separate molten pools (114, 115) thereof. Articles (130) to be coated are suspended within the coating chamber (122), and transported with a support apparatus (118) relative to the two molten pools (114, 115) so as to deposit a coating (132) with a controlled composition that is a mixture of the first and second materials (110, 111).
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Corderman Reed Roeder
Darolia Ramgopal
Nardi, Jr. Richard Arthur
Rigney Joseph David
Weimer Michael James
General Electric Company
Hartman Domenica N. S.
Hartman Gary M.
Narciso David L.
VerSteeg Steven
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