Test key for validating the position of a word line...

Active solid-state devices (e.g. – transistors – solid-state diode – Test or calibration structure

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

06946678

ABSTRACT:
A test key for validating the position of a word line structure overlaying a deep trench capacitor of a DRAM. The test key is deposited in the scribe line region of a wafer. The deep trench capacitor is deposited in the scribe line region and has a buried plate. A rectangular word line is deposited in the scribe line and covers a portion of the deep trench capacitor, and two passing word lines are deposited above the deep trench. A first doping region and a second doping region are deposited between the rectangular word line and the first passing word line and between the rectangular word line and the second passing word line respectively. A first plug, a second plug and a third plugs are coupled to the first doping region, the second doping region and the buried plate respectively.

REFERENCES:
patent: 5914512 (1999-06-01), Huang
patent: 6310361 (2001-10-01), Lichter
patent: 6339228 (2002-01-01), Iyer et al.
patent: 6812487 (2004-11-01), Wu et al.
patent: 6838296 (2005-01-01), Wu et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Test key for validating the position of a word line... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Test key for validating the position of a word line..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Test key for validating the position of a word line... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3397260

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.