Apparatus for optical measurements of nitrogen concentration...

Details Apparatus for optical measurements of nitrogen concentration... Apparatus for optical measurements of nitrogen concentration...

2005-04-19

2005-04-19

Smith, Zandra V. (Department: 2877)

Optics: measuring and testing

By polarized light examination

Of surface reflection

C356S630000

Reexamination Certificate

active

06882421

ABSTRACT:
Systems and methods are disclosed for evaluating nitrogen levels in thin gate dielectric layers formed on semiconductor samples. In one embodiment, a tool is disclosed which includes both a narrow band ellipsometer and a broadband spectrometer for measuring the sample. The narrowband ellipsometer provides very accurate information about the thickness of the thin film layer while the broadband spectrometer contains information about the nitrogen levels. In another aspect of the subject invention, a thermal and/or plasma wave detection system is used to provide information about the nitrogen levels and nitration processes.

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