Photomask visual inspection system

Details Photomask visual inspection system Photomask visual inspection system

2005-04-05

2005-04-05

Whitmore, Stacy A. (Department: 2812)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

Reexamination Certificate

active

06877151

ABSTRACT:
The coordinate value of the deficient area detected by a wafer inspecting apparatus and the wafer inspecting data are transmitted to a coordinate transforming computer by use of an inspection-data managing computer. The coordinate value detected by the wafer inspection based on the wafer inspecting data and the photomask inspecting data is transformed into the coordinate value on the photomask, to thereby analyze the deficient area of the photomask.

REFERENCES:
patent: 20020107813 (2002-08-01), Kanatani et al.
patent: 20030177469 (2003-09-01), Suttile et al.
patent: 11-233582 (1999-08-01), None

Affiliated with

Also associated with

Rating

Photomask visual inspection system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask visual inspection system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask visual inspection system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3370300