Rapid thermal heating apparatus and method

Details Rapid thermal heating apparatus and method Rapid thermal heating apparatus and method

1996-04-03

1998-01-13

Paschall, Mark H.

Electric resistance heating devices

Heating devices

Radiant heater

219405, 219411, 118725, 362 32, H05B 340, H01L 2100, C23C 1600

Patent

active

057087555

ABSTRACT:
A rapid thermal heating apparatus in which lamps are disposed in a plurality of light pipes arranged to illuminate and supply heat to a substrate. The light pipes are positioned so that the illumination patterns overlap. The energy supplied to the lamps is controlled to provide a predetermined heating pattern to the substrate. A liquid cooled window cooperates with the light pipes to transmit energy to a wafer disposed in an evacuated chamber.

REFERENCES:
patent: 2057776 (1936-10-01), Groven
patent: 2318533 (1943-12-01), Selvig
patent: 3623712 (1971-11-01), McNeilly et al.
patent: 3761678 (1973-09-01), Eckles
patent: 3836751 (1974-09-01), Anderson
patent: 3862397 (1975-01-01), Anderson et al.
patent: 3936686 (1976-02-01), Moore
patent: 4047496 (1977-09-01), McNeilly et al.
patent: 4081313 (1978-03-01), McNeilly et al.
patent: 4101759 (1978-07-01), Anthony et al.
patent: 4232360 (1980-11-01), Vakil et al.
patent: 4270260 (1981-06-01), Krueger
patent: 4378956 (1983-04-01), Lester
patent: 4389970 (1983-06-01), Edgerton
patent: 4411619 (1983-10-01), Darnell et al.
patent: 4448000 (1984-05-01), Manuccia et al.
patent: 4470369 (1984-09-01), Edgerton
patent: 4489234 (1984-12-01), Harnden, Jr. e t al.
patent: 4510555 (1985-04-01), Mori
patent: 4558660 (1985-12-01), Nishizawa et al.
patent: 4640224 (1987-02-01), Bunch et al.
patent: 4649261 (1987-03-01), Sheets
patent: 4680447 (1987-07-01), Mahawili
patent: 4680451 (1987-07-01), Gat et al.
patent: 4694143 (1987-09-01), Nishimura et al.
patent: 4698486 (1987-10-01), Sheets
patent: 4761538 (1988-08-01), Chiba et al.
patent: 4789771 (1988-12-01), Robinson et al.
patent: 4796562 (1989-01-01), Brors et al.
patent: 4818327 (1989-04-01), Davis et al.
patent: 4820377 (1989-04-01), Davis et al.
patent: 4830700 (1989-05-01), Davis et al.
patent: 4832777 (1989-05-01), Davis et al.
patent: 4832779 (1989-05-01), Fisher et al.
patent: 4836138 (1989-06-01), Robinson et al.
patent: 4854263 (1989-08-01), Chang et al.
patent: 4859832 (1989-08-01), Uehara et al.
patent: 4886954 (1989-12-01), Yu et al.
patent: 4891499 (1990-01-01), Moslehi
patent: 4911103 (1990-03-01), Davis et al.
patent: 4924073 (1990-05-01), Chiba
patent: 4956538 (1990-09-01), Moslehi
patent: 5155336 (1992-10-01), Gronet et al.
patent: 5156820 (1992-10-01), Wong et al.
patent: 5215588 (1993-06-01), Rhieu
patent: 5317492 (1994-05-01), Gronet et al.
patent: 5487127 (1996-01-01), Gronet et al.
Hodul et al., "Measurement of Dynamic Temperature Uniformity in Rapid Thermal Processing," Solid State Technology, May 1988, pp. 209-211.
Akiyama et al., "Critical Radial Temp. Gradient Inducing Slip Dislocations in Silicon Epitaxy Using Dual Heating of the Two Surfaces of a Wafer," Japan. Jour. of Applied Phys., v. 25, No. 11, Nov. 1986, pp. 1619-1622.

Affiliated with

Also associated with

Rating

Rapid thermal heating apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Rapid thermal heating apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rapid thermal heating apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-332498