Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-09-17
1993-12-21
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430326, 430910, 430920, 430921, 430925, 430926, G03C 173
Patent
active
052720420
ABSTRACT:
Disclosed is a positive photoresist. The photoresist has as its polymeric component a substantially water and base insoluble, photolabile polymer. The photoresist further includes a photo acid generator that is capable of forming a strong acid. This photo acid generator may be a sulfonate ester derived from a N-hydroxyamide, or a N-hydroxyimide. Finally, the photoresist composition includes an appropriate photosensitizer.
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Allen Robert D.
Brunsvold William R.
Carpenter Burton J.
Hinsberg William D.
LaTorre Joseph
Ashton Rosemary
Goldman Richard M.
International Business Machines - Corporation
McCamish Marion E.
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