Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2008-06-10
2008-06-10
Chiang, Jack (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000
Reexamination Certificate
active
07386830
ABSTRACT:
A method for designing an illumination light source, includes acquiring a control feature to control a dimension of a transferred pattern of a mask pattern; designating a plurality of illumination elements illuminating the mask pattern; designating first illumination lights to each of first polarization states of a light emitted from each of the illumination elements; calculating a first optical image of the control feature, formed on a first imaging plane by each of the first illumination lights; and determining an illumination shape and a polarization state distribution of the light, based on an optical characteristic of the first optical image.
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European Search Report issued by the European Patent Office dated Dec. 1, 2005, for European Patent Application No. 05018261.7.
Chiang Jack
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Memula Suresh
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