Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
Reexamination Certificate
2008-01-08
2008-01-08
Louie, Wai-Sing (Department: 2814)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
C438S758000, C438S795000, C257SE21122
Reexamination Certificate
active
07316966
ABSTRACT:
Provided herein is a substrate processing system, which comprises a cassette load station; a load lock chamber; a centrally located transfer chamber; and one or more process chambers located about the periphery of the transfer chamber. The load lock chamber comprises double dual slot load locks constructed at same location. Such system may be used for processing substrates for semiconductor manufacturing.
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EPO Communication dated Nov. 10, 2006, for EP Application No. 01971084.7.
Iscoff, R., “Dry Etching Systems: Gearing Up for La
Blonigan Wendell T.
Kurita Shinichi
Applied Materials Inc.
Louie Wai-Sing
Patterson & Sheridan LLP
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