Method for producing a vertical field effect transistor

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Details

C438S200000, C438S253000, C438S283000, C257SE21410, C257SE21442

Reexamination Certificate

active

07405127

ABSTRACT:
A method for producing a field effect transistor, in which a plurality of layers are in each case deposited, planarized and etched back, in particular a gate electrode layer, is disclosed. This method allows the manufacturing of transistors having outstanding electrical properties and having outstanding reproducibility.

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