Adaptive control method for rapid thermal processing of a...

Measuring and testing – Fluid pressure gauge – Diaphragm

Reexamination Certificate

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C073S432100

Reexamination Certificate

active

07398693

ABSTRACT:
The present invention generally relates to methods for the rapid thermal processing (RTP) of a substrate. Embodiments of the invention include controlling a thermal process using either a real-time adaptive control algorithm or by using a control algorithm that is selected from a suite of fixed control algorithms designed for a variety of substrate types. Selection of the control algorithm is based on optical properties of the substrate measured during the thermal process. In one embodiment, a combination of control algorithms are used, wherein the majority of lamp groupings are controlled with a fixed control algorithm and a substantially smaller number of lamp zones are controlled by an adaptive control algorithm.

REFERENCES:
patent: 4034420 (1977-07-01), Gotoh et al.
patent: 5692676 (1997-12-01), Walker
patent: 5724630 (1998-03-01), Mashiba

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