CMOS image sensor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S292000, C257S239000, C257SE27133

Reexamination Certificate

active

07378694

ABSTRACT:
A complementary metal-oxide semiconductor (CMOS) image sensor comprises a photodiode region generating electrical charges in response to incident light thereon. The CMOS image sensor further comprises a first floating diffusion layer adapted to receive the electrical charges from the photodiode region in response to a global transfer signal and a second floating diffusion region adapted to receive the electrical charges from the first floating diffusion region in response to a pixel selection signal.

REFERENCES:
patent: 2006/0011952 (2006-01-01), Ohkawa
patent: 08-335688 (1996-12-01), None
patent: 2003-333431 (2003-11-01), None
patent: 1020010057856 (2001-07-01), None
patent: 1020010086511 (2001-09-01), None
patent: 1020030008481 (2003-01-01), None
patent: 1020030084489 (2003-11-01), None
patent: 1020040038225 (2004-05-01), None
patent: 1020040093997 (2004-11-01), None

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