Optical metrology on patterned samples

Details Optical metrology on patterned samples Optical metrology on patterned samples

2008-01-22

2008-01-22

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By polarized light examination

Of surface reflection

C356S401000

Reexamination Certificate

active

07321426

ABSTRACT:
An optical metrology system includes model approximation logic for generating an optical model based on experimental data. By eliminating theoretical model generation, in which the fundamental equations of a test sample must be solved, the model approximation logic significantly reduces the computational requirements of the metrology system when measuring films formed on patterned base layers. The experimental model can be created by selecting an expected mathematical form for the final model, gathering experimental data, and compiling a lookup model. The lookup model can include the actual measurement data sorted by output (attribute) value, or can include “grating factors” that represent compensation factors that, when applied to standard monolithic model equations, compensate for the optical effects of grating layers.

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