4. Optics: measuring and testing
  5. By polarized light examination
  6. Of surface reflection

Leonid Poslavsky

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Apparatus and method for endpoint control and plasma monitoring

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate

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Bright and dark field scatterometry systems for line...

Optics: measuring and testing – Surface roughness
Reexamination Certificate

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Film measurement

Optics: measuring and testing – By polarized light examination – Of surface reflection
Reexamination Certificate

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Film measurement

Optics: measuring and testing – By polarized light examination – Of surface reflection
Reexamination Certificate

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Method and apparatus for measuring etch uniformity of a...

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
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Profile ID: LFUS-PAI-P-2379274

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