Polymers based on cinnamic acid as a bottom antireflective...

Details Polymers based on cinnamic acid as a bottom antireflective... Polymers based on cinnamic acid as a bottom antireflective...

2008-07-29

2008-07-29

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S009000, C430S018000, C430S905000, C430S910000, C430S311000

Reexamination Certificate

active

07405028

ABSTRACT:
A bottom antireflective coating for photolithography at 157 nm or less, where the bottom antireflective coating includes a crosslinkable polymer which contains cinnamic acid derivatives.

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