Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2008-04-22
2008-04-22
Graybill, David E (Department: 2822)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S200000, C438S210000, C438S217000, C438S218000, C438S238000, C438S239000, C438S381000, C438S382000, C438S294000, C438S305000, C438S451000, C438S510000, C438S914000, C257SE21544, C257SE21642, C257SE21644, C257SE27062
Reexamination Certificate
active
07361540
ABSTRACT:
Certain aspects of a method for reducing noise disturbing at least one signal in an electronic device may comprise shielding a first layer doped with a first dopant from a signaling layer employing a second layer doped with a second dopant. A first signaling component of the signaling layer may be coupled to the second layer and a second signaling component of the signaling layer may be coupled to the second layer. The second layer may be coupled to the first layer, and this reduces the signal disturbing noise in the electronic device. Shielding the first layer from the signaling layer may comprise disposing the second layer between the first layer and the signaling layer. Shielding the first layer from the signaling layer may comprise disposing a deep N-well between the first layer and the signaling layer.
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patent: 6212671 (2001-04-01), Kanehira et al.
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patent: 2002-84514 (2002-11-01), None
Korean Office Action issued on Oct. 31, 2005 for KR 2004-1815.
Broadcom Corporation
Graybill David E
McAndrews Held & Malloy Ltd.
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