Pattern forming method, pattern formed thereby, mold,...

Details Pattern forming method, pattern formed thereby, mold,... Pattern forming method, pattern formed thereby, mold,...

2011-06-14

2011-06-14

Walke, Amanda C. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S273100, C430S312000, C430S317000, C430S318000, C430S322000, C430S331000

Reexamination Certificate

active

07960090

ABSTRACT:
A pattern forming method includes a step of forming a pattern of a resist on a surface of a thin film formed on the base material; a step of forming a reverse layer on the pattern of the resist; a step of forming a reverse pattern, of the reverse layer complementary to the pattern of the resist by removing the resist after removing the reverse layer to expose a surface of the resist; a step of forming a hard mask layer including the thin film, on which the reverse layer is formed, by etching the thin film through the reverse pattern of the reverse layer as a mask; and a step of etching the base material through, as a mask, the hard mask layer on which the reverse layer remains or the hard mask layer on which the reverse layer has been removed.

REFERENCES:
patent: 4520097 (1985-05-01), Oguchi
patent: 5529681 (1996-06-01), Reinecke et al.
patent: 5930672 (1999-07-01), Yamamoto
patent: 6194268 (2001-02-01), Furukawa et al.
patent: 6221562 (2001-04-01), Boyd et al.
patent: 6420088 (2002-07-01), Angelopoulos et al.
patent: 6580172 (2003-06-01), Mancini et al.
patent: 6900134 (2005-05-01), Shih et al.
patent: 2006/0063112 (2006-03-01), Sreenivasan
patent: 2007/0145639 (2007-06-01), Seki et al.
patent: 2008/0047932 (2008-02-01), Terasaki et al.
patent: 2008/0166665 (2008-07-01), Jung
patent: 2008/0211133 (2008-09-01), Terasaki et al.
patent: 2010/0040838 (2010-02-01), Abdallah et al.
patent: 1 333 324 (2003-08-01), None
patent: 1 860 501 (2007-11-01), None
patent: 62-241338 (1987-10-01), None
patent: 5-346658 (1993-12-01), None
patent: 9-312336 (1997-12-01), None
H. Watanabe et al., “Submicron Feature Patterning Using Spin-On-Glass Image Reversal (SOGIR),” Journal of the Electrochemical Society, vol. 135, No. 11, pp. 2863-2866, Nov. 1988.
Chou, S. et., “Imprint of sub-25 nm vias and trenches in polymers”, Appl. Phys. Lett. 67 (21), Nov. 20, 1995, pp. 3114-3116.
Thompson, E. et al., “Fabrication of Step and Flash™ Imprint Lithography Templates Using Commercial Mask Processes”, Proc. of SPIE, vol. 5037 (2003), pp. 1019-1027.
Chou, S. et al., “Sub-10 nm imprint lithography and applications”, J. Vac. Sci. Technol. B 15(6), Nov./Dec. 1997, pp. 2897-2904.

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