Semiconductor film, semiconductor device and method for...

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2011-04-12

2011-04-12

Quach, Tuan N. (Department: 2893)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

Amorphous semiconductor

C438S485000, C438S491000, C257SE21133

Reexamination Certificate

active

07923356

ABSTRACT:
Concerning an art related to a manufacturing method for a semiconductor device having an integrated circuit using thin film transistors on a substrate, a problem is to provide a condition for forming an amorphous silicon film having distortion. In the deposition of an amorphous silicon film using a sputter method, a condition is provided with a frequency of 15 to 25 kHz and a deposition power of 0.5 to 3 kW. This can sufficiently contain Ar at 10×1020/cm3or more in an amorphous silicon film, thus making possible to form an amorphous silicon film having distortion.

REFERENCES:
patent: 4446168 (1984-05-01), Kato et al.
patent: 4749640 (1988-06-01), Tremont et al.
patent: 5055169 (1991-10-01), Hock et al.
patent: 5122482 (1992-06-01), Hayashi et al.
patent: 5132754 (1992-07-01), Serikawa et al.
patent: 5248630 (1993-09-01), Serikawa et al.
patent: 5529937 (1996-06-01), Zhang et al.
patent: 5643826 (1997-07-01), Ohtani et al.
patent: 5676765 (1997-10-01), Saito et al.
patent: 5736438 (1998-04-01), Nishimura et al.
patent: 5789284 (1998-08-01), Yamazaki et al.
patent: 5923962 (1999-07-01), Ohtani et al.
patent: 6013544 (2000-01-01), Makita et al.
patent: 6022458 (2000-02-01), Ichikawa
patent: 6048758 (2000-04-01), Yamazaki et al.
patent: 6057557 (2000-05-01), Ichikawa
patent: 6071764 (2000-06-01), Zhang et al.
patent: 6071766 (2000-06-01), Yamazaki et al.
patent: 6077758 (2000-06-01), Zhang et al.
patent: 6285042 (2001-09-01), Ohtani et al.
patent: 6287944 (2001-09-01), Hara et al.
patent: 6331457 (2001-12-01), Yamazaki et al.
patent: 6335541 (2002-01-01), Ohtani et al.
patent: 6379508 (2002-04-01), Kobayashi et al.
patent: 6424012 (2002-07-01), Kawasaki et al.
patent: 6429097 (2002-08-01), Voutsas et al.
patent: 6455401 (2002-09-01), Zhang et al.
patent: 6489189 (2002-12-01), Yamazaki et al.
patent: 6566754 (2003-05-01), Hara et al.
patent: 6686262 (2004-02-01), Yamazaki et al.
patent: 6743700 (2004-06-01), Asami et al.
patent: 6900144 (2005-05-01), Maeda et al.
patent: 6924213 (2005-08-01), Zhang et al.
patent: 6991976 (2006-01-01), Yamazaki et al.
patent: 7056775 (2006-06-01), Zhang et al.
patent: 7115453 (2006-10-01), Nakamura et al.
patent: 7384828 (2008-06-01), Asami et al.
patent: 2001/0046755 (2001-11-01), Hara et al.
patent: 2002/0098628 (2002-07-01), Hamada et al.
patent: 2002/0102764 (2002-08-01), Yamazaki et al.
patent: 2002/0125480 (2002-09-01), Nakamura et al.
patent: 2002/0134981 (2002-09-01), Nakamura et al.
patent: 2002/0151120 (2002-10-01), Yamazaki et al.
patent: 2002/0155652 (2002-10-01), Yamazaki et al.
patent: 2002/0182785 (2002-12-01), Miyairi
patent: 2002/0197785 (2002-12-01), Yamazaki et al.
patent: 2006/0148218 (2006-07-01), Yamazaki et al.
patent: 0 301 463 (1989-02-01), None
patent: 301463 (1989-02-01), None
patent: 0 651 431 (1995-05-01), None
patent: 0 947 602 (1999-10-01), None
patent: 0 651 431 (2002-03-01), None
patent: 63-28034 (1988-02-01), None
patent: 01-103825 (1989-04-01), None
patent: 07-114184 (1989-04-01), None
patent: 05-109737 (1993-04-01), None
patent: 07-094757 (1995-04-01), None
patent: 07-183540 (1995-07-01), None
patent: 07-183540 (1995-07-01), None
patent: 08-078329 (1996-03-01), None
patent: 08-078329 (1996-03-01), None
patent: 09-134882 (1997-05-01), None
patent: 09-205213 (1997-08-01), None
patent: 2000-252212 (2000-09-01), None
patent: 1999-078020 (1999-10-01), None
patent: 2000-034903 (2000-06-01), None
U.S. Appl. No. 10/190,755, filed Jul. 9, 2002 “Semiconductor Film, Semiconductor Device and Method for Manufacturing Same” (Filing Receipt, Specification, Claims and Drawings).
U.S. Appl. No. 10/155,986, filed May 29, 2002 “Semiconductor Film, Semiconductor Device and Method of Their Production” (Filing Receipt, Specification, Claims and Drawings).
Sugiyama, “Strained Silicon Crystal on SiGe Substrate”, pp. 1315-1319, Nov. 2000, Applied Physics, vol. 69 [11], and English Translation.
Office Action (Korean Application No. 2002-0030722), dated Apr. 23, 2008.

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