Automatic dynamic baseline creation and adjustment

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Mechanical measurement system

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S009000

Reexamination Certificate

active

07899627

ABSTRACT:
In a plasma processing system, a method for dynamically establishing a baseline is provided. The method includes processing a first substrate. The method also includes collecting a first signal data for the first substrate. The method further includes comparing the first signal data against the baseline. The method moreover includes including the first signal data in a recalculation of the baseline if the first signal data is within a confidence level range, which is in between a top level above the baseline and a bottom level below the baseline.

REFERENCES:
patent: 5956251 (1999-09-01), Atkinson et al.
patent: 6463391 (2002-10-01), Early
patent: 6825050 (2004-11-01), Huang et al.
“Written Opinion”, Issue in PCT Application No. PCT/US2007/078574; Mailing Date.: Oct. 30, 2007.
“International Search Report”, Issue in PCT Application No. PCT/US2007/078574; Mailing Date.: Oct. 30, 2007.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Automatic dynamic baseline creation and adjustment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Automatic dynamic baseline creation and adjustment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automatic dynamic baseline creation and adjustment will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2665229

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.