Semiconductor devices having a support structure for an...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE21415

Reexamination Certificate

active

07989854

ABSTRACT:
Semiconductor devices include a semiconductor substrate with a stack structure protruding from the semiconductor substrate and surrounded by an isolation structure. The stack structure includes an active layer pattern and a gap-filling insulation layer between the semiconductor substrate and the active layer pattern. A gate electrode extends from the isolation structure around the stack structure. The gate electrode is configured to provide a support structure for the active layer pattern. The gate electrode may be a gate electrode of a silicon on insulator (SOI) device formed on the semiconductor wafer and the semiconductor device may further include a bulk silicon device formed on the semiconductor substrate in a region of the semiconductor substrate not including the gap-filing insulation layer.

REFERENCES:
patent: 6645797 (2003-11-01), Buynoski et al.
patent: 6908816 (2005-06-01), Thurgate et al.
patent: 2003/0057487 (2003-03-01), Yamada et al.
patent: 2003/0111686 (2003-06-01), Nowak
patent: 2004/0108559 (2004-06-01), Sugii et al.
patent: 2004/0217420 (2004-11-01), Yeo et al.
patent: 2005/0064669 (2005-03-01), Orlowski et al.
patent: 2005/0253193 (2005-11-01), Chen et al.
patent: 2007/0085134 (2007-04-01), Anderson et al.
patent: 1020030065864 (2003-08-01), None

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