Methods for manufacturing high dielectric constant film

Details Methods for manufacturing high dielectric constant film Methods for manufacturing high dielectric constant film

2011-01-18

2011-01-18

Landau, Matthew C (Department: 2813)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S786000, C257SE21625, C427S255190, C427S255310

Reexamination Certificate

active

07871942

ABSTRACT:
Processes for making a high K (dielectric constant) film using an ultra-high purity hafnium containing organometallic compound are disclosed. Also described are devices incorporating high K films made with high purity hafnium containing organometallic compounds.

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