Semiconductor memory device and manufacturing method thereof

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE21680

Reexamination Certificate

active

07915119

ABSTRACT:
An active region is provided which includes a plurality of active region columns extending in a first direction and a plurality of active region rows extending in a second direction substantially orthogonal to the first direction and having concave portions. Floating electrodes and control electrodes are provided on the active region columns. An interlayer insulating film formed as a layer below an upper wiring is provided on the active region and the control electrodes. Conductive sections that electrically connect the upper wiring and the active region are respectively provided on the concave portions on the active region rows.

REFERENCES:
patent: 4935791 (1990-06-01), Namaki et al.
patent: 5204542 (1993-04-01), Namaki et al.
patent: 5731609 (1998-03-01), Hamamoto et al.
patent: 6881659 (2005-04-01), Park et al.
patent: 6894339 (2005-05-01), Fan et al.
patent: 2004/0084716 (2004-05-01), Hung et al.
patent: 2004/0130947 (2004-07-01), Fan et al.
patent: 2004/0183124 (2004-09-01), Hsu et al.
patent: 1181572 (1989-07-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor memory device and manufacturing method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor memory device and manufacturing method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor memory device and manufacturing method thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2646822

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.