Image analysis – Pattern recognition
Reexamination Certificate
2011-04-12
2011-04-12
Mariam, Daniel G (Department: 2624)
Image analysis
Pattern recognition
C382S238000, C382S283000
Reexamination Certificate
active
07925090
ABSTRACT:
A method of determining a photo mask, includes specifying a mask pattern for a photo mask for a first exposure apparatus, specifying a plurality of exposure conditions allowed to be set for a second exposure apparatus, predicting a projection image of the mask pattern to be projected on a substrate by the second exposure apparatus, for each of the exposure conditions, predicting a processed pattern to be formed on a substrate surface on the basis of the projection image, for each of the exposure conditions, determining whether or not the processed pattern meets a predetermined condition for each of the exposure conditions, and determining that the photo mask is applicable to the second exposure apparatus if the processed pattern meets the predetermined condition for at least one of the exposure conditions.
REFERENCES:
patent: 4272756 (1981-06-01), Kakumoto et al.
patent: 4641353 (1987-02-01), Kobayashi
patent: 4668089 (1987-05-01), Oshida et al.
patent: 4669123 (1987-05-01), Kobayashi et al.
patent: 4828392 (1989-05-01), Nomura et al.
patent: 4992889 (1991-02-01), Yamagami et al.
patent: 5448494 (1995-09-01), Kobayashi et al.
patent: 6272236 (2001-08-01), Pierrat et al.
patent: 6741334 (2004-05-01), Asano et al.
patent: 6990225 (2006-01-01), Tanaka et al.
patent: 6993184 (2006-01-01), Matsugu
patent: 7383530 (2008-06-01), Wang et al.
patent: 2002/0164064 (2002-11-01), Karklin et al.
patent: 2005/0008947 (2005-01-01), Akiyama
patent: 2005/0089768 (2005-04-01), Tanaka et al.
patent: 2005/0188341 (2005-08-01), Fukuhara et al.
patent: 2005/0190957 (2005-09-01), Cai et al.
patent: 9-319067 (1997-12-01), None
patent: 2002-132986 (2002-05-01), None
patent: 2002-190443 (2002-07-01), None
patent: 2002-328462 (2002-11-01), None
patent: 2004-79586 (2004-03-01), None
patent: 2005-217430 (2005-08-01), None
patent: 2007-535135 (2007-11-01), None
Notice of Reasons for Rejection mailed Dec. 7, 2010, in corresponding Japanese Patent Application No. 2005-336183, and English language translation thereof.
Fukuhara Kazuya
Izuha Kyoko
Kotani Toshiya
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Mariam Daniel G
Woldemariam Aklilu K
LandOfFree
Method of determining photo mask, method of manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of determining photo mask, method of manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of determining photo mask, method of manufacturing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2625874