Lithographic method

Details Lithographic method Lithographic method

1989-11-30

1992-05-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430394, 430494, 430942, G03C 500

Patent

active

051127245

ABSTRACT:
An electron beam lithography method with multiple low-dose scans by an electron beam (320) exposes a resist (402) pattern.

REFERENCES:
patent: 4504558 (1985-03-01), Bohlen et al.
Howard et al, "Nanometer-Scale Fabrication Techniques", Academic Press 1982, VLSI Electronics: Microstructure Science, vol. 5, pp. 145-189.

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