Process of producing negative relief copies utilizing photosensi

Details Process of producing negative relief copies utilizing photosensi Process of producing negative relief copies utilizing photosensi

Filed on

1989-12-04

Date issued

1991-05-21

Examiner

Bowers, Jr., Charles L.

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Imaging affecting physical property of radiation sensitive...

SubSubClass

Forming nonplanar surface

Other Related Categories

430330, 430191, 430192, 430165, 430270, 430920, G03C 500, G03C 152, G03F 7022, G03F 7039

Type

Patent

Status

active

Patent number

050174622

Description

ABSTRACT:
The invention describes a photosensitive composition, a copying material prepared from this composition and the production of negative relief copies, in which a photosensitive material containing a photosensitive compound comprising an ester or an amide of a 1,2-quinonediazide sulfonic acid or carboxylic acid, a binder and an s-triazine of the general formula I ##STR1## wherein R.sub.1 may be an alkyl or aryl group and

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patent: 4650743 (1987-03-01), Galloway
English Abstract of Japanese Document 58-190,946, Published 11/1983 (Sharp KK).
Dudley et al., "Cyanuric Chloride Derivatives, III-Alkoxy-s-triazines", The Journal of Am. Chem. Soc., vol. 73, 7-9/1951, pp. 2986-2992.
De Forest, W. S., Photoresist Materials and Processes, McGraw-Hill Book Co., 1975, pp. 47-59.

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