Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-04-28
1997-10-07
Niebling, John
Coating apparatus
Gas or vapor deposition
With treating means
118723MA, 427571, C23C 1600
Patent
active
056743211
ABSTRACT:
A magnetic field enhanced plasma etch reactor system for generating a radially-directed magnetic field within a reaction chamber. The reactor system comprises a reaction chamber for containing a plasma and a plurality of electromagnetic coils disposed about a reaction region within the reaction chamber. When each coil is driven with a current of similar magnitude, the electromagnetic coils produce a radially-directed magnetic field within the reaction chamber. The radially-directed magnetic field uniformly distributes the plasma throughout a bulk plasma region. Consequently, a substrate that is etched by such a uniform plasma has an improved uniformity in the etch pattern on the substrate.
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Pu Bryan
Shan Hongching
Applied Materials Inc.
Chang Joni Y.
Niebling John
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