Positive and negative working radiation sensitive mixtures and p

Details Positive and negative working radiation sensitive mixtures and p Positive and negative working radiation sensitive mixtures and p

1991-07-22

1992-06-02

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430330, 430325, G03F 730, G03F 738

Patent

active

051185857

ABSTRACT:
Positive and negative working radiation sensitive mixtures suitable in particular for producing relief patterns contain a polymeric binder and an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and also an additional group which upon irradiation forms a strong acid, the polymeric binders being reaction products of polymers that contain phenolic hydroxyl groups with dihydropyran or with alkyl vinyl ethers.

REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 4294909 (1981-10-01), Lee
patent: 4356252 (1982-10-01), Lee
Crivello, "Org. Coatings and Appl. Polymer Sci.", 48, pp. 65-69 (1985).
Pampalone, Solid State Technology, "Novolak Resins Used in Positive Resist Systems", Jun. 1984, pp. 115-120.

Affiliated with

Also associated with

Rating

Positive and negative working radiation sensitive mixtures and p does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive and negative working radiation sensitive mixtures and p, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive and negative working radiation sensitive mixtures and p will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2227731