Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1997-12-30
2000-06-06
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427579, 427237, 427238, 427239, 438905, H05H 124, B05D 722
Patent
active
060715731
ABSTRACT:
A method for precoating interior surfaces of a plasma CVD reactor after removal of built-up fluorinated silicon oxide residues by in-situ reactor cleaning. The deposition gas mixture includes F, Si, O and optional Ar. The interior surfaces can be precoated with fluorinated silicon oxide using a deposition gas mixture which includes 80 to 200 sccm SiF.sub.4 and 150 to 400 sccm O.sub.2 supplied to the reactor in a gas flow ratio of O.sub.2 :SiF.sub.4 of 1.4 to 3.2. The precoated film can be deposited at a high deposition rate to maintain high throughput in the reactor while providing a precoat film having low compressive stress and thus high film adhesion and low particle generation during subsequent substrate processing in the reactor.
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Koemtzopoulos C. Robert
Kozakevich Felix
King Roy V.
Lam Research Corporation
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