Method of forming an RIE etch barrier by in situ conversion of a

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156644, 156646, 156652, 156657, 1566591, 156668, 204192E, 427 93, H01L 21306, C23F 102, B44C 122, C03C 1500

Patent

active

044301537

ABSTRACT:
A method of forming an etch barrier in the reactive ion etching of an aromatic polyamic acid/imide which comprises:

REFERENCES:
patent: 4140572 (1979-02-01), Stein
patent: 4333793 (1982-06-01), Lifshitz et al.
patent: 4377734 (1983-03-01), Mashiko et al.

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