Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1997-02-03
2000-12-12
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430318, 430327, G03F 7207
Patent
active
061596604
ABSTRACT:
A method of forming a number of closely spaced electrodes is described wherein covering the electrodes with a conformal layer of oxide or nitride deposited using plasma enhanced chemical vapor deposition does not result in the formation of restricted regions or keyholes between adjacent electrodes. The method uses de-focussing to form the electrode mask pattern in a layer of photoresist. The focal plane in which the electrode pattern is focussed is positioned a de-focus distance above the layer of photoresist. The de-focus method results in electrodes having a trapezoidal cross section wherein the bottom of the electrode is wider than the top of the electrode. The trapezoidal cross section avoids the formation of restricted regions or keyholes when the electrodes are covered with a conformal dielectric layer, such as a layer of oxide or nitride deposited using plasma enhanced chemical vapor deposition.
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Translation of JP 63-261836 published Oct. 28, 1988.
Chen Hsin-Pai
Chen Pei-Hung
Chiang An-Min
Ackerman Stephen B.
Duda Kathleen
Prescott Larry J.
Saile George O.
Taiwan Semiconductor Manufacturing Company , Ltd.
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