Photosensitive polymers and photoresist compositions containing

Details Photosensitive polymers and photoresist compositions containing Photosensitive polymers and photoresist compositions containing

1997-05-30

1998-12-22

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430910, 526270, 526282, G03F 7004

Patent

active

058517278

ABSTRACT:
Photosensitive polymers are represented by the formula: ##STR1## wherein R1 is selected from the group consisting of hydrogen and methyl; R2 is selected from the group consisting of aliphatic hydrocarbon groups having from 6 to 20 carbon atoms; R3 is selected from the group consisting of a t-butyl group and a tetrahydropyranyl group, and m and n are selected such that the ratio m/(n+m) ranges from 0.1 to 0.9. Photoresist compositions comprise the photosensitive polymers and photoacid generators.

REFERENCES:
patent: 4591626 (1986-05-01), Kawai et al.
patent: 4629680 (1986-12-01), Iwasaki et al.
patent: 4681833 (1987-07-01), Nagasawa et al.
patent: 5419998 (1995-05-01), Mayes et al.
patent: 5443690 (1995-08-01), Takechi et al.
patent: 5635332 (1997-06-01), Nakano et al.
patent: 5665518 (1997-09-01), Maeda et al.

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