Electron beam/optical hybrid lithographic resist process in acou

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

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430312, 430314, 430318, 430329, 430394, 430942, G03C 500

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046122745

ABSTRACT:
A method is disclosed for using a combination of electron beam and photo lithography in making a acoustic wave device. The process is preformed by first using a positive photoresist and electron beam writing to designate the fine lines required in acoustic wave devices. Next, a second photoresist and optical lithography are used to delineate the pad areas.

REFERENCES:
Lyman, "Optical Lithography Refuses to Die", Electronics, Oct. 1985, pp. 36-39.
Itoh et al, "Fabrication Process for Saw Filters having 0.5 in Finger Period Electrodes", J. Vac. Sci. Technol., 20(1), 1982.
Reekstin et al, "Hybrid Lithography" Solid State Tech., 2nd Aug. 1981.
Mochiji et al, "Negative Patterning of AZ1350J by E-Beam Desensitization . . . ", Japanese J. Applied Physic, vol. 20, 1981.
Berker et al, "Dual-Polarity, Single-Resist Mixed (E-Beam/Photo) Lithography", IEEE Electron Device Letters, EDL-2(11), 1981.
Henderson et al, "Short Channel N-MOS Device Via Combined E-Beam . . . ".

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