Method and apparatus for optimizing semiconductor exposure proce

Details Method and apparatus for optimizing semiconductor exposure proce Method and apparatus for optimizing semiconductor exposure proce

1993-08-30

1994-11-22

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430327, 430942, 2504923, G03C 500

Patent

active

053668472

ABSTRACT:
A method for optimizing a pattern where the shape of the pattern is replicated on a surface, where fine areas are identified within the pattern and are combined with neighboring areas so as to reduce the number of areas within the pattern too fine to properly resolve, thereby increasing the efficacy with which the pattern is replicated.

REFERENCES:
patent: 4291231 (1981-09-01), Kawashima

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