Prevention of anti-reflection coating damage

Details Prevention of anti-reflection coating damage Prevention of anti-reflection coating damage

1996-07-22

1998-06-30

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430318, G03F 700

Patent

active

057731969

ABSTRACT:
An improved integrated circuit device with a reduced metal edge step height at the scribe line region edge and improved anti-reflection coating integrity is produced. This is accomplished by modification of the requisite photomask patterns used in circuit manufacture to provide an opaque region where the scribe line region is to be located, and an additional photomask pattern and photolithographic process to be employed after final metallization to render the scribe line region free of metallic or other material for eventual clean separation of the circuit die.

REFERENCES:
patent: 4962061 (1990-10-01), Takata
patent: 5270255 (1993-12-01), Wong

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